“Synopsys Proteus is a family of full-chip mask synthesis solutions for semiconductor manufacturing, providing technologies for proximity correction, model building, and proximity effect analysis down to 2nm and below. It is production proven for two decades and supports advanced EUV lithography processes.”
“Proteus Solutions offer the largest lithography entitlement, fast turnaround time with AI-driven solutions, and highly predictive models using advanced 3D resist and physics-based mask synthesis tools.”
“The Proteus family includes OPC, ILT, LRC, RBAF2D, GLE & MLO, DMW, SMO, and WorkBench, each designed to address specific correction, validation, and optimization needs in mask synthesis and chip manufacturing.”
“Proteus Optical Proximity Correction (OPC) delivers accurate OPC results and fast turnaround for both dense and sparse designs, with curve mask feature support. Its programmability and modular applications provide flexibility and protection of customer IP.”
“Proteus Inverse Lithography Technology (ILT) is a production-proven solution that delivers the largest process windows, higher yield, and faster time to market. It supports curve design, automated pitch relaxation, and co-optimization of assist and main features for advanced high-density designs.”
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